About this scholarly article

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Metrology, Inspection, and Process Control for Microlithography XI - Importance of wafer flatness for CMP and lithography by Zhang, Yuan; Wagner, Lucian; Golbutsov, Peter; Jones, Susan K. is a scholarly article available to read on EtoBox.

Author

Zhang, Yuan; Wagner, Lucian; Golbutsov, Peter; Jones, Susan K.

Publisher

SPIE

Published

1997

Language

EN