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About this Engineering article
Precipitation control and activation enhancement in boron-doped p+-BaSi2 films grown by molecular beam epitaxy by Khan, M. Ajmal; Nakamura, K.; Du, W.; Toko, K.; Usami, N.; Suemasu, T. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Khan, M. Ajmal; Nakamura, K.; Du, W.; Toko, K.; Usami, N.; Suemasu, T.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2014
- Language
- EN
- Field
- Engineering (Physical Sciences)
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