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About this Engineering article
Microstructure-related resistivity change after chemical–mechanical polish of Al and W thin films by Wei-Tsu Tseng; Ying-Lang Wang; James Niu is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Wei-Tsu Tseng; Ying-Lang Wang; James Niu
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 2000
- Language
- EN
- Field
- Engineering (Physical Sciences)
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