About this scholarly article

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - CVD photoresist performance for 248-nm lithography by Monget, Cedric; Joubert, Olivier P.; Weidman, Timothy W.; Toublan, Olivier; Panabiere, Jean-Pierre; Weill, Andre P.; Conley, Will is a scholarly article available to read on EtoBox.

Author

Monget, Cedric; Joubert, Olivier P.; Weidman, Timothy W.; Toublan, Olivier; Panabiere, Jean-Pierre; Weill, Andre P.; Conley, Will

Publisher

SPIE

Published

1999