About this scholarly article

SPIE Proceedings [SPIE SPIE Proceedings - (Sunday 12 February 2012)] - Interferometric lithography at 46.9 nm by Capeluto, M. G.; Vaschenko, Georgiy O.; Grisham, Michael E.; Marconi, Mario C.; Menoni, Carmen S.; Rocca, Jorge J.; Luduena, S.; Pietrasanta, L.; Marcano O., Aristides; Paz, Jose Luis is a scholarly article available to read on EtoBox.

Author

Capeluto, M. G.; Vaschenko, Georgiy O.; Grisham, Michael E.; Marconi, Mario C.; Menoni, Carmen S.; Rocca, Jorge J.; Luduena, S.; Pietrasanta, L.; Marcano O., Aristides; Paz, Jose Luis

Publisher

SPIE

Published

2004