About this scholarly article

2015 China Semiconductor Technology International Conference - An optimized W process for metal gate electrode gap filling application by Jianhua Xu, ; Xuezhen Jing, ; Xiaoniu Fu, ; Xiaona Wang, ; Jingjing Tan, ; Ziying Zhang, ; Beichao Zhang, is a scholarly article available to read on EtoBox.

Author

Jianhua Xu, ; Xuezhen Jing, ; Xiaoniu Fu, ; Xiaona Wang, ; Jingjing Tan, ; Ziying Zhang, ; Beichao Zhang,

Publisher

IEEE

Published

2015