About this scholarly article

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Automatic parallel optical proximity correction and verification system by Progler, Christopher J.; Watanabe, Takahiro; Tsujimoto, Eiji; Nakajo, Kyoji; Maeda, Keiji is a scholarly article available to read on EtoBox.

Author

Progler, Christopher J.; Watanabe, Takahiro; Tsujimoto, Eiji; Nakajo, Kyoji; Maeda, Keiji

Publisher

SPIE

Published

2000