About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advanced Etch Technology for Nanopatterning - 3d modeling of LER transfer from the resist to the underlying substrate: the effect of the resist roughness by Kokkoris, G; Constantoudis, V; Gogolides, E; Zhang, Ying is a scholarly article available to read on EtoBox.

Author

Kokkoris, G; Constantoudis, V; Gogolides, E; Zhang, Ying

Publisher

SPIE

Published

2012

Language

EN