About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - New methodologies for lower-K1 EUV OPC and RET optimization by Panning, Eric M.; Goldberg, Kenneth A.; Hooker, Kevin; Kazarian, Aram; Zhou, Xibin; Tuttle, Josh; Xiao, Guangming; Zhang, Yunqiang; Lucas, Kevin is a scholarly article available to read on EtoBox.

Author

Panning, Eric M.; Goldberg, Kenneth A.; Hooker, Kevin; Kazarian, Aram; Zhou, Xibin; Tuttle, Josh; Xiao, Guangming; Zhang, Yunqiang; Lucas, Kevin

Publisher

SPIE

Published

2017

Language

EN