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About this Engineering article
Correlation of charge transport to intrinsic strain in silicon oxynitride and Si-rich silicon nitride thin films by S. Habermehl; R. T. Apodaca is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- S. Habermehl; R. T. Apodaca
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2004
- Language
- EN
- Field
- Engineering (Physical Sciences)