Opening book details…
About this Engineering article
Inductively Coupled Plasma-Assisted RF Magnetron Sputtering Deposition of Highly Uniform SiC Nanoislanded Films by Cheng, Qijin; Xu, S.; Huang, Shiyong; Long, Jidong; Ren, Yuping; Xu, Ming; Ostrikov, Kostya is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Cheng, Qijin; Xu, S.; Huang, Shiyong; Long, Jidong; Ren, Yuping; Xu, Ming; Ostrikov, Kostya
- Publisher
- IEEE; Institute of Electrical and Electronics Engineers; Institute of Electrical and Electronics Engineers (IEEE) (ISSN 0093-3813)
- Published
- 2008
- Language
- EN
- Field
- Engineering (Physical Sciences)