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About this Engineering article
Effect of HCl/O2 and O2 dry environments on the distribution of boron in oxide and silicon from thermally deposited boron by Kemhadjian, H.; Mhango, G.M. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Kemhadjian, H.; Mhango, G.M.
- Publisher
- The Institution of Electrical Engineers; Institution of Electrical Engineers; Institution of Electrical Engineers (IEE); Institution of Engineering and Technology (IET) (ISSN 0143-7100)
- Published
- 1988
- Language
- EN
- Field
- Engineering (Physical Sciences)