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About this Materials Science article
High-rate deposition of a-Si:H using electron cyclotron resonance plasma by Seiichi Kato; Takeshi Aoki is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Seiichi Kato; Takeshi Aoki
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0022-3093)
- Published
- 1985
- Field
- Materials Science (Physical Sciences)