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About this Materials Science article
An optical method for evaluating the degradation mechanism of a developing RuO2 thick film resistor element for power modules by NAKAMURA, Yoshinobu; KITANAKA, Yuki; MIYAYAMA, Masaru; ITO, Takeshi; URANO, Koichi; TANAKA, Kiyoshi; NAKAJIMA, Tomohiko; TSUCHIYA, Tetsuo is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- NAKAMURA, Yoshinobu; KITANAKA, Yuki; MIYAYAMA, Masaru; ITO, Takeshi; URANO, Koichi; TANAKA, Kiyoshi; NAKAJIMA, Tomohiko; TSUCHIYA, Tetsuo
- Publisher
- Japan Science and Technology Information Aggregator, Electronic; Ceramic Society of Japan; Ceramic Society of Japan/Nippon Seramikkusu Kyokai (ISSN 0914-5400)
- Published
- 2017
- Language
- EN
- Field
- Materials Science (Physical Sciences)