About this scholarly article

Proceedings on Bipolar Circuits and Technology Meeting - Progress in speed power performance of bipolar technology by sub-10 keV B implantation into amorphized Si by Ehinger, K.; Kakoschke, R.; Hartwig, D.; Walz, C.; Weng, J. is a scholarly article available to read on EtoBox.

Author

Ehinger, K.; Kakoschke, R.; Hartwig, D.; Walz, C.; Weng, J.

Publisher

IEEE

Published

1990

Language

EN