About this scholarly article

2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology - Superior ArF PR etching selectivity and via CD control using fluorocarbon polymer deposition technique for 45nm-node by Park, Jong-Jin; Sohn, Se-Il; En, Kwang-Ho; Seo, Han-Ki; Chae, Min-Chul; Jeon, Byoung-Goo; Kim, Sung-il; Park, Young-Wook; Lee, Chil-Ki is a scholarly article available to read on EtoBox.

Author

Park, Jong-Jin; Sohn, Se-Il; En, Kwang-Ho; Seo, Han-Ki; Chae, Min-Chul; Jeon, Byoung-Goo; Kim, Sung-il; Park, Young-Wook; Lee, Chil-Ki

Publisher

IEEE

Published

2010

Language

EN