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About this Engineering article
Internal Stress in V 3 Si Thin Films Prepared by Magnetron Sputtering by Takenaka, Hisataka; Michikami, Osamu is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Takenaka, Hisataka; Michikami, Osamu
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 1983
- Language
- EN
- Field
- Engineering (Physical Sciences)