About this scholarly article

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Molecular resists with t-butyl cholate as a dendrimer core by Kim, Jin-Baek; Oh, Tae Hwan; Kwon, Young-Gil; Fedynyshyn, Theodore H. is a scholarly article available to read on EtoBox.

Author

Kim, Jin-Baek; Oh, Tae Hwan; Kwon, Young-Gil; Fedynyshyn, Theodore H.

Publisher

SPIE

Published

2002

Language

EN