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The document discusses the development of a high-concentration ozone generator designed to produce ozone for the oxidation of silicon at atmospheric pressure. This generator utilizes a silica gel adsorption technique to concentrate ozone from an ozone-oxygen mixture, achieving concentrations up to 30 vol % continuously and over 70 vol % in batch processes. The effectiveness of this method was demonstrated by the growth of SiO2 films on silicon substrates, significantly outperforming pure oxygen in terms of

Author

clement

Language

EN