About this scholarly article

SPIE Proceedings [SPIE International Symposium on Microelectronics and MEMS - Adelaide, Australia (Monday 17 December 2001)] Device and Process Technologies for MEMS and Microelectronics II - Low-frequency process for silicon-on-insulator deep reactive ion etching by Wasilik, Matthew; Pisano, Albert P.; Chiao, Jung-Chih; Faraone, Lorenzo; Harrison, H. Barry; Shkel, Andrei M. is a scholarly article available to read on EtoBox.

Author

Wasilik, Matthew; Pisano, Albert P.; Chiao, Jung-Chih; Faraone, Lorenzo; Harrison, H. Barry; Shkel, Andrei M.

Publisher

SPIE

Published

2001

Language

EN