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Nanometer‐thick Patterned Conductive Films Prepared Through the Self‐synthesis of Polythiophene Derivatives by Cheng‐Dar Liu; Chih‐Kai Huang; Sheng‐Yen Wu; Jin‐Lin Han; Kuo‐Huang Hsieh is a scholarly article available to read on EtoBox.

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## Abstract The development of flexible electronics requires the patterning of conductive and active semiconductor films. Although inorganic materials such as indium tin oxide and metal nanoparticles have high conductivity and transparency, their poor interfacial adhesion with organic layers, lack of flexibility, high weight and high capital costs are drawbacks. In contrast, organic conducting polymers have great potential for use in commercial flexible electronic applications because of their low production costs, environmental stability and acceptable conductivities. A UV‐curable photoresist containing hydroxyl groups was prepared from a mixture of a photoinitiator, epoxy‐acrylate resin, hydroxyethyl methacrylate and tripropylene glycol diacrylate. Patterns having line widths/spaces of 100/100 μm and 10/5 μm were fabricated on a poly(ethylene terephthalate) (PET) substrate using lithography techniques. (3‐Methyl‐3,4‐dihydro‐2__H__‐thieno[3,4‐b]dioxepin‐3‐yl)methanol (ProDOT‐OH) was self‐synthesized through urethane linkages onto the surface of the patterned photoresist on the PET film, which was then dipped into a solution of another monomer, 3‐thienylethoxybutanesulfonate (TEBS)

Author

Cheng‐Dar Liu; Chih‐Kai Huang; Sheng‐Yen Wu; Jin‐Lin Han; Kuo‐Huang Hsieh

Publisher

John Wiley and Sons; Wiley (John Wiley & Sons); John Wiley & Sons Inc.; Wiley (ISSN 0959-8103)

Published

2009

Language

EN