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About this Engineering article
Plasma etching using SF6 and chlorine gases : M. Mieth and A. Barker and G. Corn. Semiconductor Int. 222 (May 1984) is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0026-2714)
- Published
- 1985
- Field
- Engineering (Physical Sciences)