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About this Engineering article
High-rate Deposition of Silicon Nitride Thin Films Using Plasma-assisted Reactive Sputter Deposition by Takenaka, Kosuke (author);Setsuhara, Yuichi (author);Han, Jeon Geon (author);Uchida, Giichiro (author);Ebe, Akinori (author) is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Takenaka, Kosuke (author);Setsuhara, Yuichi (author);Han, Jeon Geon (author);Uchida, Giichiro (author);Ebe, Akinori (author)
- Publisher
- Elsevier B.V.
- Published
- 2019
- Language
- EN
- Field
- Engineering (Physical Sciences)