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This document summarizes a study on the properties of zirconia films prepared by direct current reactive magnetron sputtering. The key points are: 1) Zirconia films were deposited using this technique and then annealed at temperatures from 300-850°C. 2) As-deposited films were amorphous but crystallized at 400°C, with monoclinic and tetragonal phases present. Higher annealing temperatures increased the monoclinic phase. 3) Refractive index decreased from 1.93 for as-deposited films to 1.71 for films ann

Author

Zeen Majid

Language

EN