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About this Engineering article

The effects of deposition temperature on the interfacial properties of SiH4reduced blanket tungsten on TiN glue layer by Young J. Lee; Chong-Ook Park; Dong-Won Kim; John S. Chun is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Young J. Lee; Chong-Ook Park; Dong-Won Kim; John S. Chun
Publisher
Springer US; Springer-Verlag; Springer New York LLC; Springer Science and Business Media LLC (ISSN 0361-5235)
Published
1994
Language
EN
Field
Engineering (Physical Sciences)

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