About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Evaluation of novel processing approaches to improve extreme ultraviolet (EUV) photoresist pattern quality by Wallow, Thomas I.; Hohle, Christoph K.; Montgomery, Cecilia; Chun, Jun Sung; Fan, Yu-Jen; Jen, Shih-Hui; Neisser, Mark; Cummings, Kevin D.; Montgomery, Warren; Saito, Takashi; Huli, Lior; Hetzer, David; Matsumoto, Hiroie; Metz, Andrew; Rastogi, Vinayak is a scholarly article available to read on EtoBox.

Author

Wallow, Thomas I.; Hohle, Christoph K.; Montgomery, Cecilia; Chun, Jun Sung; Fan, Yu-Jen; Jen, Shih-Hui; Neisser, Mark; Cummings, Kevin D.; Montgomery, Warren; Saito, Takashi; Huli, Lior; Hetzer, David; Matsumoto, Hiroie; Metz, Andrew; Rastogi, Vinayak

Publisher

SPIE

Published

2015