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Tungsten Trioxide Film Photoanodes Prepared by Aerosol Pyrolysis for Photoelectrochemical Applications by Martin Brada; Michael Neumann-Spallart; Josef Krýsa is a Materials Science article available to read on EtoBox.

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The present work describes the preparation of tungsten trioxide photoanodes by aerosol pyrolysis on FTO/glass substrates. WO 3 layers were characterised by profilometry, XRD, SEM and photoelectrochemistry (linear voltammetry and chronoamperometry under illumination). Optimal deposition conditions to obtain a relatively thick layer were found to be: 11 mm nozzle diameter, 2.5 cm nozzle to substrate distance, and 105 cm/s airflow velocity. A deposition temperature of at least 450 • C was necessary to obtain γ-monoclinic WO 3 . The as-deposited layers had loose particles on the surface; however, these particles could be removed by scotch tape with no influence on the roughness and photoactivity of the layer. The highest photocurrent was achieved by annealing the layers at 450 • C; however, such layers were not photoelectrochemically stable. To obtain superior long-term stability, an annealing temperature of 550 • C was necessary. The highest, stable photocurrent of ~ 990 μA/cm 2 (E = 0.9 V vs. Ag/AgCl, 1 sun) was achieved for a layer thickness of 3.8 μm.

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Author

Martin Brada; Michael Neumann-Spallart; Josef Krýsa

Publisher

Elsevier BV

Published

2022

Language

EN

Field

Materials Science (Physical Sciences)