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About this Engineering article
Highly selective chemical mechanical polishing of Si 3 N 4 over SiO 2 using advanced silica abrasive by Bae, KiHo; Baek, Kye Hyun; Kim, JaeSeok; Kim, Hoyoung; Yoon, Bo Un; Kim, Jae Jeong is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Bae, KiHo; Baek, Kye Hyun; Kim, JaeSeok; Kim, Hoyoung; Yoon, Bo Un; Kim, Jae Jeong
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 2017
- Language
- EN
- Field
- Engineering (Physical Sciences)