About this scholarly article

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - MPC model validation using reverse analysis method by Hayashi, Naoya; Kasprowicz, Bryan S.; Lee, Sukho; Shin, So-Eun; Shon, Jungwook; Park, Jisoong; Shin, Inkyun; Jeon, Chan-Uk is a scholarly article available to read on EtoBox.

Author

Hayashi, Naoya; Kasprowicz, Bryan S.; Lee, Sukho; Shin, So-Eun; Shon, Jungwook; Park, Jisoong; Shin, Inkyun; Jeon, Chan-Uk

Publisher

SPIE

Published

2015

Language

EN