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Numerical Simulations To Study Growth of Single-Crystal Diamond by zhangyyping is a document available to read on EtoBox.

This document presents a model for microwave plasma chemical vapor deposition (CVD) aimed at studying the growth of single-crystal diamond using reactive species (H, C, N). The model emphasizes the chemistry among these reactive species and the dynamics of species in a practical configuration, yielding results consistent with previous studies. It also provides two-dimensional distributions of various hydrocarbon and nitrogen-related species for the first time under practical conditions.

Author
zhangyyping
Language
EN