About this scholarly article

SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - 180-nm mask fabrication process using ZEP 7000, multipass gray, GHOST, and dry etch for MEBES 5000 by Lu, Maiying; Coleman, Thomas P.; Sauer, Charles A.; Grenon, Brian J.; Abboud, Frank E. is a scholarly article available to read on EtoBox.

Author

Lu, Maiying; Coleman, Thomas P.; Sauer, Charles A.; Grenon, Brian J.; Abboud, Frank E.

Publisher

SPIE

Published

1998