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About this Engineering article
Generating ∼90 Nanometer Features Using Near-field Contact-mode Photolithography with an Elastomeric Phase Mask by J. A. Rogers is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- J. A. Rogers
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
- Published
- 1998
- Language
- EN
- Field
- Engineering (Physical Sciences)