Opening book details…
About this Engineering article
Influence of sputtering power and the substrate–target distance on the properties of ZrO2 films prepared by RF reactive sputtering by Pengtao Gao; L.J Meng; M.P dos Santos; V Teixeira; M Andritschky is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Pengtao Gao; L.J Meng; M.P dos Santos; V Teixeira; M Andritschky
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 2000
- Field
- Engineering (Physical Sciences)
More by Pengtao Gao; L.J Meng; M.P dos Santos; V Teixeira; M Andritschky
Browse all works by Pengtao Gao; L.J Meng; M.P dos Santos; V Teixeira; M Andritschky