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About this Engineering article
Structural Dependence of Source-and-Drain Series Resistance on Saturation Drain Current for Sub-20 nm Metal–Oxide–Semiconductor Field-Effect Transistors by Yoon, JongChul; Hiroki, Akira; Kobayashi, Kazutoshi is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Yoon, JongChul; Hiroki, Akira; Kobayashi, Kazutoshi
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 2013
- Language
- EN
- Field
- Engineering (Physical Sciences)
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