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About this Engineering article
The effect of ultra-thin Al 2 O 3 layers on the dielectric properties of LaAlO 3 thin film on silicon by Yan, L; Kong, L B; Ong, C K is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Yan, L; Kong, L B; Ong, C K
- Publisher
- Institute of Physics; IOP Publishing; Institute of Physics Publishing (ISSN 0268-1242)
- Published
- 2004
- Language
- EN
- Field
- Engineering (Physical Sciences)