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About this Engineering article
Study of plasma CVD silicon-germanium films using electron beam techniques : J. Wood, M. M. El-Gomati, S. D. Waterman, T. El-Bakush and M. E. Law. Vacuum 43(1/2), 111 (1992) is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0026-2714)
- Published
- 1992
- Language
- EN
- Field
- Engineering (Physical Sciences)