Skip to content

Opening book details…

About this scholarly article

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction (Keynote Paper) by Pain, L.; Mackay, R. Scott; Jurdit, M.; Todeschini, J.; Manakli, S.; Icard, B.; Minghetti, B.; Bervin, G.; Beverina, A.; Leverd, F.; Broekaart, M.; Gouraud, P.; De Jonghe, V.; Brun, Ph.; Denorme, S.; Boeuf, F.; Wang, V.; Henry, D. is a scholarly article available to read on EtoBox.

Author
Pain, L.; Mackay, R. Scott; Jurdit, M.; Todeschini, J.; Manakli, S.; Icard, B.; Minghetti, B.; Bervin, G.; Beverina, A.; Leverd, F.; Broekaart, M.; Gouraud, P.; De Jonghe, V.; Brun, Ph.; Denorme, S.; Boeuf, F.; Wang, V.; Henry, D.
Publisher
SPIE
Published
2005

More by Pain, L.; Mackay, R. Scott; Jurdit, M.; Todeschini, J.; Manakli, S.; Icard, B.; Minghetti, B.; Bervin, G.; Beverina, A.; Leverd, F.; Broekaart, M.; Gouraud, P.; De Jonghe, V.; Brun, Ph.; Denorme, S.; Boeuf, F.; Wang, V.; Henry, D.

Browse all works by Pain, L.; Mackay, R. Scott; Jurdit, M.; Todeschini, J.; Manakli, S.; Icard, B.; Minghetti, B.; Bervin, G.; Beverina, A.; Leverd, F.; Broekaart, M.; Gouraud, P.; De Jonghe, V.; Brun, Ph.; Denorme, S.; Boeuf, F.; Wang, V.; Henry, D.