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About this Engineering article
Atomic Layer Deposition and Properties of Silicon Oxide Thin Films Using Alternating Exposures to SiH 2 Cl 2 and O 3 by Lee, Won-Jun; Han, Chang-Hee; Park, Jae-Kyun; Lee, Youn-Seoung; Rha, Sa-Kyun is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Lee, Won-Jun; Han, Chang-Hee; Park, Jae-Kyun; Lee, Youn-Seoung; Rha, Sa-Kyun
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 2010
- Language
- EN
- Field
- Engineering (Physical Sciences)
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