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About this Materials Science article
Spin-coating for fabrication of high-entropy high-k (AlTiVZrHf)O films on Si for advanced gate stacks by Huang, Ze-Wei (author);Chang, Kao-Shuo (author) is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Huang, Ze-Wei (author);Chang, Kao-Shuo (author)
- Publisher
- Elsevier BV
- Published
- 2021
- Field
- Materials Science (Physical Sciences)
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