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About this Engineering article
Measurement of the dopant concentration in a semiconductor using the Seebeck effect by Pó, J M; Brito, M C; Alves, J Maia; Silva, J A; Serra, J M; Vallêra, A M is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Pó, J M; Brito, M C; Alves, J Maia; Silva, J A; Serra, J M; Vallêra, A M
- Publisher
- Institute of Physics; IOP Publishing; Institute of Physics and the Physical Society (ISSN 0957-0233)
- Published
- 2013
- Language
- EN
- Field
- Engineering (Physical Sciences)
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