About this document

Two-Step Curing in UV Nanoimprint Lithography by Thang is a document available to read on EtoBox.

The document presents a two-step curing method for demoulding in UV nanoimprint lithography (UV NIL) to enhance pattern transferring fidelity while minimizing demoulding force. It identifies three states of resist curing—uncuring, undercuring, and full-curing—that affect the quality of the imprint and proposes a new method involving two UV exposures to optimize the curing process. Experimental results demonstrate that this method leads to improved pattern fidelity and reduced damage to the mould during subs

Author

Thang

Language

EN