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About this Engineering article
Erratum to “High indium content homogenous InAlN layers grown by plasma assisted molecular beam epitaxy” [J. Cryst. Growth 454 (2016) 164–172] by Kyle, Erin C.H.; Kaun, Stephen W.; Wu, Feng; Bonef, Bastien; Speck, James S. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Kyle, Erin C.H.; Kaun, Stephen W.; Wu, Feng; Bonef, Bastien; Speck, James S.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0022-0248)
- Published
- 2018
- Field
- Engineering (Physical Sciences)
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