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This document provides an introduction and overview of VLSI design concepts. It defines key terms related to the VLSI fabrication process such as substrate, photolithography, etching, diffusion, and oxidation. It also discusses concepts like fabrication yield, defect density, beading effect, electromigration, lateral doping, and aspect ratio. The document introduces stick diagrams as a means to represent VLSI designs and lists the common layers in a CMOS process. It provides examples of logic gate designs a

Author

Naveen Bhat

Language

EN