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About this Engineering article
High Temperature Plasma Immersion Ion Implantation Using Hollow Cathode Discharges in Small Diameter Metal Tubes by Ueda, Mario; Silva, Carla; de Souza, Gelson B.; Pichon, Luc; Reuther, Helfried is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Ueda, Mario; Silva, Carla; de Souza, Gelson B.; Pichon, Luc; Reuther, Helfried
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics; AVS Science and Technology Society (ISSN 1520-8567)
- Published
- 2019
- Field
- Engineering (Physical Sciences)
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