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About this Engineering article
Advanced secondary ion mass spectroscopy quantification in the first few nanometer of B, P, and As ultrashallow implants by Merkulov, A.; Peres, P.; Choi, S.; Horreard, F.; Ehrke, H.-U.; Loibl, N.; Schuhmacher, M. is a Engineering article available to read on EtoBox.
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- Author
- Merkulov, A.; Peres, P.; Choi, S.; Horreard, F.; Ehrke, H.-U.; Loibl, N.; Schuhmacher, M.
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics; AVS Science and Technology Society (ISSN 1520-8567)
- Published
- 2010
- Language
- EN
- Field
- Engineering (Physical Sciences)