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About this Engineering article
Dopant Diffusion in Si1-xGex Thin Films: Effect of Epitaxial Stress by Portavoce, Alain; Berbezier, Isabelle; Ronda, Antoine; Gas, Patrick; Christensen, J.S.; Kuznetsov, Andrej Yu.; Svensson, Bengt G. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Portavoce, Alain; Berbezier, Isabelle; Ronda, Antoine; Gas, Patrick; Christensen, J.S.; Kuznetsov, Andrej Yu.; Svensson, Bengt G.
- Publisher
- Trans Tech Publications, Ltd.; Trans Tech Publications Ltd (ISSN 1662-9507)
- Published
- 2006
- Language
- EN
- Field
- Engineering (Physical Sciences)