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Radiative Heat Transfer Analysis in Pure Water Heater Used for Semiconductor Processing by L.H. Liu; K. Kudo; A. Mochida; T. Ogawa; K. Kadotani is a Engineering article available to read on EtoBox.

What is Radiative Heat Transfer Analysis in Pure Water Heater Used for Semiconductor Processing about?

A simpliÿed one-dimensional model is presented to analyze the non-gray radiative transfer in pure water heater used in the rinsing processes within semiconductor production lines, and the ray-tracing method is extended to simulate the radiative heat transfer. To examine the accuracy of the simpliÿed model, the distribution of radiation absorption is determined by the ray-tracing method based the simpliÿed model and compared with the data obtained by three-dimensional non-gray model in combination with Monte Carlo method in reference, and the e ects of the water thickness on the radiation absorption are analyzed. The results show that the simpliÿed model has a good accuracy in solving the radiation absorption in the pure water heater. The radiation absorption increases with the water thickness, but when the water thickness is greater than 50 mm, the radiation absorption increases very slowly with the water thickness.

Who reads Radiative Heat Transfer Analysis in Pure Water Heater Used for Semiconductor Processing?

Author

L.H. Liu; K. Kudo; A. Mochida; T. Ogawa; K. Kadotani

Publisher

Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 0022-4073)

Published

2004

Language

EN

Field

Engineering (Physical Sciences)