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About this Engineering article
Tailoring silicon oxide film properties by tuning the laser beam-to-substrate distance in ArF laser-induced chemical vapor deposition by T. Szörényi; P. González; E. Garcá; J. Pou; D. Fernández; J. Serra; B. León; M. Pérez-Amor is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- T. Szörényi; P. González; E. Garcá; J. Pou; D. Fernández; J. Serra; B. León; M. Pérez-Amor
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 1994
- Field
- Engineering (Physical Sciences)