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About this Engineering article
Nitrogen Gas Flow Ratio and Rapid Thermal Annealing Temperature Dependences of Sputtered Titanium Nitride Gate Work Function and Their Effect on Device Characteristics by Y. Liu; T. Hayashida; T. Matsukawa; K. Endo; M. Masahara; S. O'uchi; K. Sakamoto; K. Ishii; J. Tsukada; Y. Ishikawa; H. Yamauchi; A. Ogura; E. Suzuki is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Y. Liu; T. Hayashida; T. Matsukawa; K. Endo; M. Masahara; S. O'uchi; K. Sakamoto; K. Ishii; J. Tsukada; Y. Ishikawa; H. Yamauchi; A. Ogura; E. Suzuki
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 2008
- Language
- EN
- Field
- Engineering (Physical Sciences)