About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - EUVL compatible LER solutions using functional block copolymers by Cheng, Han-Hao; Keen, Imelda; Yu, Anguang; Chuang, Ya-Mi; Blakey, Idriss; Jack, Kevin S.; Leeson, Michael J.; Younkin, Todd R.; Whittaker, Andrew K.; Tong, William M. is a scholarly article available to read on EtoBox.

Author

Cheng, Han-Hao; Keen, Imelda; Yu, Anguang; Chuang, Ya-Mi; Blakey, Idriss; Jack, Kevin S.; Leeson, Michael J.; Younkin, Todd R.; Whittaker, Andrew K.; Tong, William M.

Publisher

SPIE

Published

2012